Linards SKUJA
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Dr. habil. phys. Linards SKUJA
Leading Researcher
Institute of Solid State Physics,
University of LatviaKengaraga iela 8
Riga, LV 1063
Latvia
Phone: +371 6726 0756
Fax: +371 6713 2778
E-mail: skuja_at_latnet.lv |
Born: 1952, Riga, Latvia
Interests:
- Point defects in crystalline and amorphous solids
- Nature of non-crystalline solids
- Applications of glassy materials, particularly silicon dioxide-based glasses in
optoelectronics
- SiO2-related nanostructures and surface phenomena
- Optical, magnetic resonance and X-ray fluorescence spectroscopy
- Applications of computers in physical experiment
Brief description of the main research:
The general research interests concern glassy/amorphous materials for optics and
electronics. The main focus is on oxide materials based on SiO2 and GeO2.
The motivation for studying these materials is provided by the outstanding physical
properties of glassy SiO2 and the key role it plays in a number of modern
applications: low-loss optical fibers for communications, ultraviolet and high-power laser
optics, insulating oxide layers in silicon-based microelectronics, radiation resistant
optical glasses etc. Our work mainly concerns point defects in these materials, their
structure, generation mechanisms and optical properties, their impact on practical
applications and devices.
Languages: Latvian, English, German, Russian
Education:
- University of Latvia (Faculty of Physics and Mathematics), 1974
- Postgraduate, University of Latvia, 1977-1980
- Dr.phys. (Candidate of Science in former USSR, PhD in Western countries), Institute of
Physics, Latvia, 1980
- Dr.habil.phys., Institute of Solid State Physics, University of Latvia, 1994
Experience:
- Engineer, Junior Researcher, Laboratory of Semiconductor Physics, University of Latvia,
1972-1977.
- Junior Researcher, Senior Researcher, Leading Researcher, Head of Laboratory, Institute of Solid State Physics, University of Latvia,
1980
Work Abroad:
- Visiting scientist in Torino University, Italy (1989)
- Alexander-von-Humboldt Fellow, University of Muenster,
Germany, 1991-1992, 1995.
- Visiting scientist, Nagoya University, Japan 1994
- Research scientist, German Federal Institute of Natural and Engineering Sciences
(Physikalisch-Technische Bundesanstalt, PTB),
Braunschweig, Germany 1995-1998.
- Visiting professor Tokyo Institute of Technology,
Yokohama, Japan 1999
- Visiting scientist/visiting professor, Tokyo
Institute of Technology, 2000-2011 (~2-3 months per year)
Honours and Awards
- Corresponding Member, Latvian Academy of Sciences, 1996
- Full Member, Latvian Academy of Sciences, 2003
- The Latvian Academy of Sciences Edgar Silins Prize in
Physics, 2003.
Professional Activities and Memberships:
- Member, Latvian Physical Society.
Recent Publications (2006-2011):
- K. Kajihara, M.Hirano, L.Skuja, H.Hosono, Role of Interstitial Voids in Oxides on
Formation and Stabilization of Reactive Radicals: Interstitial HO2 Radicals in F2 -Laser-Irradiated Amorphous SiO2. J.
Amer.Chem.Soc., v.128, p.5371-5374 (2006).
- K. Kajihara, M.Hirano, L.Skuja, H.Hosono, Interstitial OH radicals in F2-laser-irradiated
bulk amorphous SiO2. J.Phys.Chem.B v.110, p.10224-10227 (2006).
- L.Skuja, K. Kajihara, M. Hirano, A.. Saitoh, H. Hosono,
An increased F2 laser damage in "wet"
silica glass due to atomic hydrogen: a new hydrogen-related E’-center. J.
Non-Crystalline Solids, v.352, p.2297-2302 (2006).
- K. Kajihara, L.Skuja, M.Hirano, H.Hosono, Vacuum-ultraviolet absorption of interstitial
O2 and H2O molecules in SiO2 glass. J. Non-Crystalline
Solids, v.352, p.2303-2306 (2006).
- K. Kajihara, L.Skuja, M.Hirano, H.Hosono, In situ observation of the formation,
diffusion, and reactions of hydrogenous species in F2
-laser-irradiated SiO2 glass using a pump-and-probe technique. Phys. Rev. v.
B74, p.094202(1-11) (2006).
- K. Kajihara, M. Hirano, L.Skuja, H.Hosono Reactivity of SiCl and SiF groups in SiO2
glass with mobile interstitial O2 and H2O molecules. J.
Non-Crystalline Solids, v.353, p.514-517 (2007).
- K. Kajihara, M. Hirano, L.Skuja, H.Hosono Formation of Intrinsic Point Defects in
Fluorine-doped Synthetic SiO2 Glass by 60Co gamma-ray
Irradiation Chemistry Letters Vol.36, No.2, p.266-267 (2007).
- L. Skuja, K. Kajihara, M.Hirano, H.Hosono. Fluorine laser-induced silicon hydride Si-H
groups in silica. J. Non-Crystalline Solids, v.353, p.526-529 (2007).
- K.Kajihara, M.Hirano, Y.Takimoto, L.Skuja, H.Hosono. Diffusion of nitrogen molecules in
amorphous SiO2 . Appl.Phys. Lett. v.91, p.071904 (1-3) (2007).
- L. Skuja, K. Kajihara, M.Hirano, H.Hosono. Ultraviolet absorption of
hydrogen-related species in glassy silica, Physics and Chemistry of Glasses, European
Journal of Glass Science and Technology B vol.48, No3, p.103-106 (2007).
- L. Skuja, K. Kajihara, M.Hirano, H.Hosono. Hydrogen-related radiation defects in SiO2
- based glasses. Nuclear Instruments and Methods in Physics Research Section B. v.266,
No12-13, p.2971-75 (2008).
- K. Kajihara, T. Miura, H. Kamioka, A.Aiba, M. Uramoto, Y. Morimoto, M. Hirano, L. Skuja,
H. Hosono, Diffusion and reactions of interstitial oxygen species in amorphous SiO2:
A review. J.Non-Crystalline Solids v.354, p.224-232(2008).
- K. Kajihara, M. Hirano, L. Skuja, H. Hosono, Intrinsic defect formation in amorphous SiO2
by electronic excitation: Bond dissociation versus Frenkel mechanisms, Phys. Rev. B78,
p.094201(1-8) (2008).
- K. Kajihara, M. Hirano, L. Skuja, H. Hosono, 60Co gamma-ray-induced intrinsic
defect processes in fluorine-doped synthetic SiO2 glasses of different fluorine
concentrations. Materials Science and Engineering: B v.161 p.96-99 (2009) (
doi:10.1016/j.mseb.2008.11.002).
- K. Kajihara, T. Miura, H. Kamioka, M. Hirano, L. Skuja, H. Hosono, Oxygen exchange at
the internal surface of amorphous SiO2 studied by photoluminescence of
isotopically labeled oxygen molecules. Phys. Rev. Letters v.102, 175502(2009).
- K. Kajihara, T. Miura, H. Kamioka, M. Hirano, L. Skuja, H. Hosono, Isotope Effect on the
Infrared Photoluminescence Decay of Interstitial Oxygen Molecules in Amorphous SiO2
. Applied Physics Express vol.2, p. 056502 (2009).
- K. Kajihara, T. Miura, H. Kamioka, M. Hirano, L. Skuja, H. Hosono, Photoluminescence
study of diffusion and reactions of 18O-labeled interstitial oxygen molecules
in amorphous SiO2. Electrochemical Society Transactions v.25 (9)
p.277-285 (2009).
- K.Kajihara, T.Miura, H.Kamioka, M.Hirano. L.Skuja, H.Hosono, Diffusion of oxygen
molecules in fluorine-doped amorphous SiO2 . Materials Science and Engineering:
B173 p.158-161 (2010)(doi:10.1016/j.mseb.2010.01.002).
- K.Kajihara, T.Miura, H.Kamioka, M.Hirano. L.Skuja, H.Hosono, Exchange between
interstitial oxygen molecules and network oxygen atoms in amorphous SiO2
studied by 18O isotope labeling and infrared photoluminescence spectroscopy.
Phys.Rev. B83, 064202 (2011).
- L.Skuja, K.Kajihara, M.Hirano, H.Hosono, Crucial dependence of excimer laser toughness
of “wet” silica on excess oxygen J. Non-Crystalline Solids v.357
p.1875–1878 (2011) (doi:10.1016/j.jnoncrysol.2010.12.047).
- K.Kajihara, M.Hirano, L.Skuja, H.Hosono Oxygen-excess amorphous SiO2 with 18O-labeled
interstitial oxygen molecules J. Non-Crystalline Solids v.357, No 8-9,
p.1842-1845(2011) .
- K.Kajihara, M.Hirano, L.Skuja, H.Hosono Frenkel defect process in amorphous silica Proc.
of SPIE Vol. 8077 80770R-1 (2011).
- L.Skuja, K.Kajihara, M.Hirano, A.Silins, H.Hosono Effects of temperature on electron
paramagnetic resonance of dangling oxygen bonds in amorphous silicon dioxide, IOP Conf.
Series: Materials Science and Engineering 23 (2011) 012016
- L. Skuja, K. Kajihara, M. Hirano, H. Hosono, Visible to vacuum-UV range optical
absorption of oxygen dangling bonds in amorphous SiO2, Phys.Rev.B 84, 205206
(2011) [9 pages] doi: 10.1103/PhysRevB.84.205206
Research Projects:
- L.Skuja (Head of Project) Study of Point Defects and their Generation in SiO2
and GeO2 Based Glasses and Crystals. Latvian Council of Science, (1993 -
1996 )
- L.Skuja (Head of Project) Spectroscopic Studies of Point Defects in Oxide Materials with
Different Degree of Structural Disorder. Latvian Council of Science, (1996
2000)
- L.Skuja (Head of Project) Investigation of Point Defects in Wide-Gap Glassforming
Materials for Microelectronics, Optical Waveguides and Laser Optics. Latvian Council of
Science, (2001 - 2004)
- L.Skuja (Head of Project) Study of Optical Properties, their Optimization and Variation
Mechanisms in Glassy Materials for Ultraviolet Optics and Fiber Wave-guides. Latvian
Council of Science, (2005 - )
- L.Skuja (Leader of the work packet:"Defects in oxide glasses and related
materials") within the EC sponsored program "Excellence Center for Advanced
Material Research and Technology" (CAMART) in Institute of Solid State Physics
- L. Skuja (local coordinator) of European research-training network "Optical Devices
Using Photosensitivity for their Elaboration (2000-2004).
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Last update 20.01.2012